Abstract
A method to calculate the dielectric strength (DS) for SF 6/CF4 mixtures of various ratios was proposed. The cross sections of relevant electron-molecule processes in Cf4 and SF 6 were scaled to stimulate DS, electron drift velocities , and attachment and ionization coefficients. The possible variations of the differences of the rate constants between the mixture and the pure gas and observed the qualitative stability. It was found that the asymmetric location of the mixture content vs DS maximum was related to the increased SF6 ionization and also to suppressed CF4 ionization.
Original language | English (US) |
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Pages (from-to) | 109-117 |
Number of pages | 9 |
Journal | Journal of Applied Physics |
Volume | 96 |
Issue number | 1 |
DOIs | |
State | Published - Jul 1 2004 |
ASJC Scopus subject areas
- General Physics and Astronomy